Ferroelectric α-In2Se3 Semi-floating Gate Transistors for Multilevel Memory and Optoelectronic Logic Gate (2025)

    Functional Inorganic Materials and Devices

    • Yanze Song

      Yanze Song

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Zhidong Pan

      Zhidong Pan

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Chengming Luo

      Chengming Luo

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Yue Wang

      Yue Wang

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Tao Zheng

      Tao Zheng

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Yuan Pan

      Yuan Pan

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Nabuqi Bu

      Nabuqi Bu

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Ruiyang Xu

      Ruiyang Xu

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

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    • Nengjie Huo*

      Nengjie Huo

      Guangdong Provincial Key Laboratory of Chip and Integration Technology, School of Electronic Science and Engineering (School of Microelectronics), South China Normal University, Foshan 528225, People’s Republic of China

      *Email: [emailprotected]

      More by Nengjie Huo

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    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2025, XXXX, XXX, XXX-XXX

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    https://pubs.acs.org/doi/10.1021/acsami.5c01586

    Published April 23, 2025

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    Ferroelectric α-In2Se3 Semi-floating Gate Transistors for Multilevel Memory and Optoelectronic Logic Gate (3)

    Progress in artificial intelligence (AI) demands efficient data storage and high-speed processing. Traditional von Neumann architecture, with space separation of memory and computing units, struggles with increased data transmission, causing power inefficiency and date latency. To address this challenge, we designed a semi-floating gate transistor (SFGT) that integrates data storage and logical operation into a single device by employing a ferroelectric semiconductor α-In2Se3 as a semi-floating gate layer. Leveraging the ferroelectric polarization of α-In2Se3, the device exhibits improved non-volatile memory performance with a high program/erase ratio of 1 × 106 and reliable durability over 1000 cycles. Through the dual-gate modulation, the SFGT achieves multilevel storage function with at least seven controllable programming states and performs three types of digital logic gate operations (“AND”, “NOR”, and “OR”) at an ultralow bias of 10 mV. Compared to traditional FGT architectures, the α-In2Se3-based semi-floating gate structure achieves multifunctional integration of data storage and logic computing, effectively addressing energy consumption and time delay issues in data transmission, making it highly significant for applications in data-intensive and low-power integrated circuits.

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    • Circuits
    • Layers
    • Polarization
    • Transistors
    • Two dimensional materials

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    ACS Applied Materials & Interfaces

    Cite this: ACS Appl. Mater. Interfaces 2025, XXXX, XXX, XXX-XXX

    Click to copy citationCitation copied!

    Published April 23, 2025

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    • Received

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    • Revised

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      online

    © 2025 American Chemical Society

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